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Niobium titanium nitride-based superconductor-insulator-superconductor mixers for low-noise terahertz receivers

机译:用于低噪声太赫兹接收器的铌钛氮化物基超导体-绝缘体-超导体混合器

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摘要

Integrating NbTiN-based microstrip tuning circuits with traditional Nb superconductor-insulator-superconductor (SIS) junctions enables the low-noise operation regime of SIS mixers to be extended from below 0.7?to?1.15?THz. In particular, mixers incorporating a NbTiN/SiO2/NbTiN microstrip tuning circuit offer low-noise performance below 0.8–0.85?THz, although their sensitivities drop significantly at higher frequencies. Furthermore, a microstrip geometry in which NbTiN is used as the ground plane material only (NbTiN/SiO2/Al) yields significant improvements in the sensitivities of SIS mixers operating up to 1.15?THz, with an upper operating frequency that depends upon the quality of the NbTiN layer, and thus its deposition process. Films deposited at room temperature have Tc = 14.4?K and ?n,20?K ? 60????cm, and offer low-noise performance up to 1?THz, whereas films deposited at 400?°C have Tc = 16?K and ?n,20?K ? 110????cm, and offer low-noise performance up to 1.15?THz. Taken together, these results demonstrate that the high-frequency surface resistance of a NbTiN layer depends upon the film’s structural properties. Most significantly, the drop in performance that is seen at F>1?THz in mixers incorporating NbTiN ground planes deposited at room temperature is attributed to nonhomogeneities in the structural and electrical properties of these films, as is the poor performance of mixers that incorporate NbTiN wiring layers at F>0.85?THz. The development of these NbTiN-based microstrip tuning circuits will enable the production of low-noise SIS mixers for the 0.8–0.96- and 0.96–1.12-THz frequency bands of the Heterodyne Instrument for the Far Infrared on board the European Space Agency’s Herschel Space Observatory.
机译:将基于NbTiN的微带调谐电路与传统的Nb超导体-绝缘体-超导体(SIS)结相集成,可以将SIS混频器的低噪声工作范围从0.7Ω扩展到1.15 THz以下。特别是,结合了NbTiN / SiO2 / NbTiN微带调谐电路的混频器在0.8–0.85?THz以下可提供低噪声性能,尽管其灵敏度在较高频率下会显着下降。此外,其中仅将NbTiN用作接地平面材料(NbTiN / SiO2 / Al)的微带几何结构可显着提高SIS混频器的灵敏度,该混频器在高达1.15?THz的频率下工作,其较高的工作频率取决于质量。 NbTiN层及其沉积过程。在室温下沉积的薄膜的Tc = 14.4?K和?n,20?K?。 60 ???? cm,并提供高达1?THz的低噪声性能,而在400?C下沉积的薄膜的Tc = 16?K和?n,20?K?。 110平方厘米,并提供高达1.15太赫兹的低噪声性能。总而言之,这些结果表明NbTiN层的高频表面电阻取决于薄膜的结构特性。最重要的是,在室温下沉积了掺有NbTiN接地层的混合器中,在F> 1?THz处观察到的性能下降是由于这些薄膜的结构和电学性能不均匀造成的,而掺入NbTiN的混合器的性能较差F> 0.85?THz的布线层。这些基于NbTiN的微带调谐电路的开发将使得能够生产欧洲航天局Herschel太空船上用于远红外异变仪的0.8–0.96和0.96–1.12-THz频带的低噪声SIS混频器。天文台。

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